As the basis for making photovoltaic cells and integrated circuits, can silicon wafers be cleaned with a dry ice cleaning machine? The effect of cleaning in the electronics industry directly affects the final performance, efficiency and stability of photovoltaic cells and integrated circuits. Due to the insufficient cleanliness of silicon materials, 50% of them have problems or even fail. Therefore, it is necessary to optimize the cleaning process of silicon wafers.

Can silicon wafers be cleaned with dry ice?

When the temperature exceeds 31.1°C and the pressure reaches 7.38mpa, CO2 is in a supercritical state and gas-solid conversion can be realized. Carbon dioxide is suddenly ejected from the cylinder through the nozzle, the pressure drops, the volume expands rapidly, and the constant enthalpy of carbon dioxide changes. The gas-liquid mixture of carbon dioxide produces solid dry ice particles, thereby realizing the cleaning of silicon wafers. Dry ice pellets have different mechanisms for removing particulate and organic impurities.

When removing particulate impurities, the dry ice particles elastically collide with the particulate impurities to generate momentum transfer, and the particulate impurities are crushed and taken away by the high-speed airflow. When the organic impurities are removed, the dry ice particles collide with the organic matter inelastically, the dry ice particles liquefy and wrap the organic matter away from the surface of the silicon wafer, and then solidify and are carried away by the high-speed airflow. A new dry ice particle spray cleaning technology was proposed, using 5N purity, 8Mpa CO2 gas source pressure, 11mpa nozzle pressure and other cleaning parameters, and finally obtained a good cleaning effect.

Dry ice cleaning machine Dry ice particle cleaning technology is an ideal cleaning technology, which will not damage the surface of silicon wafers and will not pollute the environment.

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